20 September 2007 Reflective optics for sub-10nm hard x-ray focusing
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Abstract
Nanofocused X-rays are indispensable because they can provide high spatial resolution and high sensitivity for X-ray nanoscopy/spectroscopy. A focusing system with reflective optics is one of the most promising methods for producing nanofocused X-rays due to its high efficiency and beams size. So, far we realize efficient hard X-ray focusing with a beam size of 25nm. Our next project is realization of sub-10nm hard X-ray focusing. Here, we describe the design of the graded multilayer mirror and evaluation method for hard X-ray focused beam.
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H. Mimura, H. Mimura, S. Matsuyama, S. Matsuyama, H. Yumoto, H. Yumoto, S. Handa, S. Handa, T. Kimura, T. Kimura, Y. Sano, Y. Sano, K. Tamasaku, K. Tamasaku, Y. Nishino, Y. Nishino, M. Yabashi, M. Yabashi, T. Ishikawa, T. Ishikawa, K. Yamauchi, K. Yamauchi, } "Reflective optics for sub-10nm hard x-ray focusing", Proc. SPIE 6705, Advances in X-Ray/EUV Optics and Components II, 67050L (20 September 2007); doi: 10.1117/12.734752; https://doi.org/10.1117/12.734752
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