10 October 2007 Plasmonic nanostructures made from aluminum fabricated by EUV interference lithography
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Proceedings Volume 6717, Optomechatronic Micro/Nano Devices and Components III; 67170P (2007) https://doi.org/10.1117/12.754350
Event: International Symposium on Optomechatronic Technologies, 2007, Lausanne, Switzerland
Abstract
Extreme Ultra Violet (EUV) interference lithography was employed for fabrication of large-area, sub-100 nm scale Al nanoparticles as well as free-standing aluminum hole arrays. We studied the optical properties of the fabricated Al nanostructures. The marked difference in Al, compared to Au and Ag, is that its plasmon resonances lie in the UV range. Thus, the high-frequency plasmon resonance of Al nanostructures enables the extending of plasmonic research into the UV range and opens up new possible applications of plasmonics.
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Y. Ekinci, Y. Ekinci, H. H. Solak, H. H. Solak, C. David, C. David, J. F. Löffler, J. F. Löffler, } "Plasmonic nanostructures made from aluminum fabricated by EUV interference lithography", Proc. SPIE 6717, Optomechatronic Micro/Nano Devices and Components III, 67170P (10 October 2007); doi: 10.1117/12.754350; https://doi.org/10.1117/12.754350
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