20 December 2007 Laser damage of silica and hafnia thin films made with different deposition technologies
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Abstract
A comparative study is made on the laser damage resistance of monolayers coatings made with different technologies. HfO2 and SiO2 thin films have been deposited on fused silica substrates with Dual Ion Beam Sputtering, Electron Beam Deposition (with and without Ion Assistance) and Reactive Low Voltage Ion Plating technologies. The laser damage thresholds of these coatings have been determined at 1064nm and 355nm using a nanosecond pulsed YAG laser, and a 1-on-1 test procedure.
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Laurent Gallais, Jérémie Capoulade, Jean-Yves Natoli, Mireille Commandré, Michel Cathelinaud, Cian Koc, Michel Lequime, "Laser damage of silica and hafnia thin films made with different deposition technologies", Proc. SPIE 6720, Laser-Induced Damage in Optical Materials: 2007, 67200S (20 December 2007); doi: 10.1117/12.752952; https://doi.org/10.1117/12.752952
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