20 December 2007 Performance enhancement of ion beam sputtered oxide coatings for 193 nm
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The utilization of oxide mixtures as layer material for coating design has been transferred to the ion beam sputtering technology and was applied to high-reflecting as well as anti-reflecting components at the wavelength of 193nm. Exclusively, the oxides SiO2 and Al2O3 are candidates for appropriate thin film designs below 200nm. Experimental data received from laser-calorimetric measurements, spectroscopic investigations and laser-induced damage tests are presented for several specimens. With respect to state-of-the-art thin film deposition in the DUV spectral range, conventional quarterwave designs have also been characterized and will be compared to the sputtered mixed oxide coatings.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Blaschke, M. Lappschies, D. Ristau, "Performance enhancement of ion beam sputtered oxide coatings for 193 nm", Proc. SPIE 6720, Laser-Induced Damage in Optical Materials: 2007, 67200T (20 December 2007); doi: 10.1117/12.752908; https://doi.org/10.1117/12.752908


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