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20 December 2007 Performance enhancement of ion beam sputtered oxide coatings for 193 nm
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Abstract
The utilization of oxide mixtures as layer material for coating design has been transferred to the ion beam sputtering technology and was applied to high-reflecting as well as anti-reflecting components at the wavelength of 193nm. Exclusively, the oxides SiO2 and Al2O3 are candidates for appropriate thin film designs below 200nm. Experimental data received from laser-calorimetric measurements, spectroscopic investigations and laser-induced damage tests are presented for several specimens. With respect to state-of-the-art thin film deposition in the DUV spectral range, conventional quarterwave designs have also been characterized and will be compared to the sputtered mixed oxide coatings.
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H. Blaschke, M. Lappschies, and D. Ristau "Performance enhancement of ion beam sputtered oxide coatings for 193 nm", Proc. SPIE 6720, Laser-Induced Damage in Optical Materials: 2007, 67200T (20 December 2007); https://doi.org/10.1117/12.752908
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