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14 November 2007 Indirect optical thickness monitoring with stationary test-slides for precision optical coatings
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Proceedings Volume 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 672224 (2007) https://doi.org/10.1117/12.783121
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China
Abstract
In this paper, a novel method, changeable wavelength optical thickness monitoring with quartz crystal thickness monitoring, is firstly outlined for monitoring non-quarter wave thickness. For several multi-layer optical coatings with high performance, a lot of deposition experiments with the ion-assisted deposition technique have firstly done about optical materials SiO2, Ti3O5, and Ta2O5 at room temperature, in order to obtain high dense and low absorbance layers from VIS to NIR wave band. Using the reverse synthesis method, the refractive index, extinction coefficient and tooling factor value of these materials have been obtained accurately. With the above monitoring method, we have then successfully manufactured some multi-layer optical coatings on Bak7 glass and sapphire substrates, and the multi-layer optical coatings have past environmental tests. The appropriate deposition technique parameters and the typical problems about indirect optical thickness monitoring from the deposition process are detailedly discussed in this paper.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
XiLin Yao, ChangXin Xiong, ChangCheng Yang, and NanChun Tong "Indirect optical thickness monitoring with stationary test-slides for precision optical coatings", Proc. SPIE 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 672224 (14 November 2007); https://doi.org/10.1117/12.783121
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