Optimization of deposition uniformity in a planet rotation system with precise mask design

Jin Luo; Songlin Chen; Ping Ma

doi:10.1117/12.783156

14 November 2007 Optimization of deposition uniformity in a planet rotation system with precise mask design

Jin Luo, Songlin Chen, Ping Ma

Proceedings Volume 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 67222I (2007) https://doi.org/10.1117/12.783156
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China

Abstract

Generally, substrates in a planetary rotation system result in coatings with nonuniformity of 2% or greater over apertures of 500mm. However, more accurate, uniform deposition of large-aperture optical coatings is required now. So it is very important to study how to improve the deposition uniformity of large-aperture optical coatings. In this paper, we show that a theoretical model that can forecast the thickness distributions of films, get precise figure of masks, and should optimize the deposition uniformity accurately and fast through fixing the designed masks in the chamber.

Citation Download Citation

Jin Luo, Songlin Chen, and Ping Ma "Optimization of deposition uniformity in a planet rotation system with precise mask design", Proc. SPIE 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 67222I (14 November 2007); https://doi.org/10.1117/12.783156

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