14 November 2007 Analysis of laser-induced damage threshold in dielectric optical film
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Proceedings Volume 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 67222S (2007); doi: 10.1117/12.783358
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China
Abstract
The theory based on energy-band, which tracks free-electron in optical dielectrics, is established to describe laser-dielectrics-interaction process. The relations between damage threshold and laser frequency, band gap are investigated. Numerical analysis on SiO2-TiO2 stacks has been done. One-dimensional finite difference method is used to solve kinetic equation. The results show that the damage threshold of pure material decreases with the increase of laser frequency. And it increases with the increase of band gap.
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Xuchuan Shang, Ping Ma, Jianping Hu, Rongzhu Zhang, "Analysis of laser-induced damage threshold in dielectric optical film", Proc. SPIE 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 67222S (14 November 2007); doi: 10.1117/12.783358; https://doi.org/10.1117/12.783358
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KEYWORDS
Ionization

Laser damage threshold

Neon

Dielectrics

Laser induced damage

Plasma

Laser irradiation

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