Study on chemical mechanical polishing process of lithium niobate

Shengli Wang; Yuling Liu; Zhenxia Li

doi:10.1117/12.783529

14 November 2007 Study on chemical mechanical polishing process of lithium niobate

Shengli Wang, Yuling Liu, Zhenxia Li

Proceedings Volume 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 67223L (2007) https://doi.org/10.1117/12.783529
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China

Abstract

Chemical mechanical polishing of lithium niobate wafer in alkaline slurries has been investigated. In the lithium niobate CMP, the slurry was made by adding colloidal silica abrasive to de-ionized water. The effects of polishing plate speed, slurry flow rate, polishing pressure on removal rate in actual CMP process has been discussed in order to determine the optimum conditions for those parameters. The optimal slurry component is colloid SiO₂, concentration SiO₂:DW=1:1; KOH concentration 0.5~1.5% and surfactant 5~15ml/L. The process conditions are polishing plate speed 60rpm, polishing pressure 140KPa and slurry flow rate 120ml/min. The removal rate can reach 300nm/min and surface roughness is 0.21nm.

Citation Download Citation

Shengli Wang, Yuling Liu, and Zhenxia Li "Study on chemical mechanical polishing process of lithium niobate", Proc. SPIE 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 67223L (14 November 2007); https://doi.org/10.1117/12.783529

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