Deposition and applications of high performance YF3 thin films

Linfeng Yang; Changxin Xiong; Mi Zhu

doi:10.1117/12.783540

14 November 2007 Deposition and applications of high performance YF₃ thin films

Linfeng Yang, Changxin Xiong, Mi Zhu

Proceedings Volume 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 67223Q (2007) https://doi.org/10.1117/12.783540
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China

Abstract

In this work, the improvement of IAD technique to packing density of YF₃ films with low absorption over the broadest spectral range, has been investigated. YF₃ films were prepared by e-beam evaporation of pure YF₃ with Ion Assisted Deposition, DI=0A, 0.8A, 1.0A, 1.2A, (D_I is the drive current during deposition of the YF₃ films). The packing density of films is inspected generally by water and salt water soak test. The optical properties of all samples were measured and analyzed before and after soak test. The calculation of optical constants for different samples is based on spectrum cures. By comparing the varieties of refractive index and extinction coefficient of different samples, we have found the ideal process parameters of deposition for YF₃ film. Then, the 3~5 μm and/or 8-11.5 μm infrared antireflective coatings have been fabricated by using the process parameters of deposition YF₃. All samples passed MIL-F-48616 environmental tests and meet with the application demands of military optoelectric equipment.

Citation Download Citation

Linfeng Yang, Changxin Xiong, and Mi Zhu "Deposition and applications of high performance YF₃ thin films", Proc. SPIE 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 67223Q (14 November 2007); https://doi.org/10.1117/12.783540

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