14 November 2007 High quality HfO2 thin films prepared by reactive ion beam assisted deposition
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Proceedings Volume 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 67223X (2007) https://doi.org/10.1117/12.783567
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China
Abstract
HfO2 films have been deposited with electron beam evaporation of oxide hafnium, reactive evaporation (RE) and reactive ion beam assisted deposition (RIBAD). The optical and structural properties and laser-induced damage threshold of the films have been studied. It was found that HfO2 film deposited with RE has less defects and good uniformity. In addition, the samples deposited with RIBAD have higher refraction index, and can reduce the absorption at a certain condition. Laser-induced damage (LIDT) is under improvement. The crystal structure of the sample deposited with RIBAD is monoclinic, and when the bombardment energy raises, the preferred orientation changes from (002) to (-111).
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Congjuan Wang, Congjuan Wang, Yunxia Jin, Yunxia Jin, Jianda Shao, Jianda Shao, Zhengxiu Fan, Zhengxiu Fan, } "High quality HfO2 thin films prepared by reactive ion beam assisted deposition", Proc. SPIE 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 67223X (14 November 2007); doi: 10.1117/12.783567; https://doi.org/10.1117/12.783567
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