Paper
27 November 2007 Whole visible range imaging ellipsometry
Hau-Wei Wang, Yi-Chen Hsieh, Kai-Ping Chuang, Fu-Shiang Yang, Chun-I Wu
Author Affiliations +
Proceedings Volume 6723, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 67230Q (2007) https://doi.org/10.1117/12.782996
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China
Abstract
The ellipsometric image contrast for patterned film in whole visible range is simulated and analyzed in this article. By the Fresnel equation and the Jones Matrix, the characteristic wavelength selection method to enhance the image contrast is built. The ellipsometric reflected intensity of specific thin film is nulled into dark by rotating the phase angle of compensator and the azimuth angle of polarizer in whole visible range, which results in higher contrast between non-null and null images after the proper wavelength selection. The approach enables the image defect recognition of patterned film more obvious than recent single wavelength imaging ellipsometry and white light reflective image.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hau-Wei Wang, Yi-Chen Hsieh, Kai-Ping Chuang, Fu-Shiang Yang, and Chun-I Wu "Whole visible range imaging ellipsometry", Proc. SPIE 6723, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 67230Q (27 November 2007); https://doi.org/10.1117/12.782996
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Silicon

Ellipsometry

Inspection

Range imaging

Imaging spectroscopy

Polarizers

Refractive index

Back to Top