27 November 2007 Research on the measuring method of the slope error of EUV/x-ray optical elements and measuring apparatus of long trace profiler
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Proceedings Volume 6723, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 67231W (2007) https://doi.org/10.1117/12.783209
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China
Abstract
The technology on the processing and detection of the extreme ultraviolet radiation and x-ray (EUV/x-ray) optical component is one of the main categories in modern short-wave band optical research. At present, EUV/x-ray optical component are in great demand on the construction of the rapidly developed synchrotron radiant lamp-house and beam of light engineering in developed countries. Now few countries has the ability of developing this kind of optical component with super-smooth surface and high precision and the key technology is processing and detecting technique. In this paper, the author study the measurement method and instrument of the EUV/x-ray optical component, improve the design of the measuring apparatus-long trace profiler LTP already existing, provide a kind of newly long trace profiler LTP-III, which is used to measure slope error.
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Changxi Xue, Changxi Xue, Furong Huo, Furong Huo, Chengzhi Zhou, Chengzhi Zhou, Weicai Deng, Weicai Deng, } "Research on the measuring method of the slope error of EUV/x-ray optical elements and measuring apparatus of long trace profiler", Proc. SPIE 6723, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 67231W (27 November 2007); doi: 10.1117/12.783209; https://doi.org/10.1117/12.783209
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