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17 January 2008 Novel interferometry for crystal thickness measurement
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Proceedings Volume 6723, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 67235U (2008) https://doi.org/10.1117/12.783826
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China
Abstract
Crystal has been widely used in optical fields. In many instances the thickness of optical axis direction of crystal as an important physical parameter needs to be confirmed, so it is necessary to accurately measure the crystal thickness. In this paper we propose to measure the crystal thickness by using the birefringence characteristics of crystal and analyze the feasibility in theory. Furthermore we validated the realization process of the measuring system and the algorithm of calculating crystal thickness by experiments. The repeatable measuring precision was several nanometers.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lijuan Zhao, Chaowei Tang, Guotian He, Xiaolong Li, and Mingyi Fu "Novel interferometry for crystal thickness measurement", Proc. SPIE 6723, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 67235U (17 January 2008); https://doi.org/10.1117/12.783826
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