28 November 2007 Development of an experimental EUVL system
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Proceedings Volume 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; 672408 (2007) https://doi.org/10.1117/12.782464
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China
Abstract
An experimental EUVL system has been developed to investigate EUV imaging system design, component fabrication, assembly technique and experimental process. The system includes a laser produced plasma (LPP) source, an ellipsoidal condenser, a transmission mask, a reduced projection optics, and vacuum system. We designed a 10:1 reduction projection optics using Schwarzschild system with spherical mirrors to achieve 0.1μm resolution. The Schwarzschild optics coated with Mo/Si multilayers was assembled with wavefront error (WFE) of 0.014 waves RMS at 632.8nm wavelength under computer-aided alignment method. Using this system a fine pattern of less than 0.25μm covering a 0.1mm diameter image field of view was clearly replicated on resist-coated wafer.
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Chun-shui Jin, Chun-shui Jin, Li-Ping Wang, Li-Ping Wang, Li-Chao Zhang, Li-Chao Zhang, Qiang Lin, Qiang Lin, Shu Pei, Shu Pei, Jian-Lin Cao, Jian-Lin Cao, "Development of an experimental EUVL system", Proc. SPIE 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 672408 (28 November 2007); doi: 10.1117/12.782464; https://doi.org/10.1117/12.782464
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