19 November 2007 Reactive ion beam etching of large-aperture multilayer diffraction gratings by radio frequency ion beam source
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Proceedings Volume 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; 67240K (2007) https://doi.org/10.1117/12.782520
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China
Abstract
The major etching processes of a large-aperture multilayer diffraction grating, including the uniformity of the ion beam current along the major axis and the on-line measurement of the diffraction intensity distribution are described. A large-aperture ion beam etcher with radio frequency linear source has been developed to fabricate large-aperture diffractive optical elements. The length with ±5.1% uniformity of the ion beam current distribution along the major axis is 30 cm. A series of multilayer diffraction gratings were etched successfully by using this etcher with CHF3 chemistry. Multilayer diffraction gratings on a 80 mm×150 mm BK7 substrate etched for laser systems are shown. The grating exhibits an averaged diffraction efficiency about 96% at TE polarization of 1 064 nm light viewed at Littrow angle.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ying Liu, Dequan Xu, Xiangdong Xu, Yilin Hong, Shaojun Fu, "Reactive ion beam etching of large-aperture multilayer diffraction gratings by radio frequency ion beam source", Proc. SPIE 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 67240K (19 November 2007); doi: 10.1117/12.782520; https://doi.org/10.1117/12.782520
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