Novel method for measuring axial aberrations of projection optics for lithographic tools

Mingying Ma; Fan Wang; Xiangzhao Wang

doi:10.1117/12.782572

19 November 2007 Novel method for measuring axial aberrations of projection optics for lithographic tools

Mingying Ma, Fan Wang, Xiangzhao Wang

Proceedings Volume 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; 67240N (2007) https://doi.org/10.1117/12.782572
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China

Abstract

As the critical dimension shrinks, degradation of lithographic quality because of axial aberrations in the projection optics has become more obvious. To minimize the adverse effect of axial aberrations on imaging, accurate in-situ measurement of axial aberrations is necessary. In this paper, a novel in-situ method to measure axial aberrations is proposed. In this novel method, a new type of measurement mark for measuring the axial aberrations is designed. By using new marks, the axial aberrations can be obtained by the linewidth variation of two bars in the marks. The linewidth variation is proportional to the focus shift in which the measurement mark is exposed. The proportional factor can be obtained by the simulation software Prolith. From the linewidth variation and proportional factor, the focus shift of the measurement mark in different positions can be calculated. The axial aberrations can be obtained by the calculated focus shift. In this novel measurement method, both the measurement procedure and data-processing are simple. As the measurement accuracy of the focus shift in z direction is increased, the measurement accuracy of axial image quality increases by more than 25%.

Citation Download Citation

Mingying Ma, Fan Wang, and Xiangzhao Wang "Novel method for measuring axial aberrations of projection optics for lithographic tools", Proc. SPIE 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 67240N (19 November 2007); https://doi.org/10.1117/12.782572

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KEYWORDS

Projection systems

Lithography

Semiconducting wafers

Lithographic illumination

Image quality

Critical dimension metrology

Finite element methods

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