Translator Disclaimer
Paper
21 November 2007 Nanolithography in evanescent near field by using nano-filmed noble metal layers
Author Affiliations +
Proceedings Volume 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; 67241A (2007) https://doi.org/10.1117/12.782841
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China
Abstract
Nanolithography has been investigated by using optical proximity exposure in the evanescent near field in nano-filmed noble metals. Sub-diffraction-limited feature size can be resolved by using i-line illumination exposure. Compared with the model of original superlens, we separated the superlens 100nm away from the mask, under the illumination of i-line light, the initial simulation shows that the sub-diffraction-limited feature as small as 60nm linewidth with 120nm pitch can be clearly resolved without hard contact between mask and nano-filmed noble metal. By proper design of the materials and the parameters of nano-filmed layers, better resolution can be realized.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yong Yang, Song Hu, Hanmin Yao, Guanxiao Cheng, and Wei Yan "Nanolithography in evanescent near field by using nano-filmed noble metal layers", Proc. SPIE 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 67241A (21 November 2007); https://doi.org/10.1117/12.782841
PROCEEDINGS
6 PAGES


SHARE
Advertisement
Advertisement
Back to Top