21 November 2007 Substrate patterning for passive matrix organic light-emitting devices by photolithography processing
Author Affiliations +
Proceedings Volume 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; 67241E (2007) https://doi.org/10.1117/12.782855
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China
Abstract
The fabrication technology of high resolution substrate pattern for organic light-emitting devices (OLEDs) was discussed in the paper. Surface morphology and crystallization properties of ITO films and the shape of photolithography pattern were investigated. Experimental results show that three factors including deposition pressure, flow ratio of argon to oxygen and annealing temperature greatly influence the conductance of ITO film.. Some attempts about designing photomask were enumerated and the reverse taper angle separator was successfully fabricated with image reversal process.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jun Wang, Jun Wang, Jun-sheng Yu, Jun-sheng Yu, Hui Lin, Hui Lin, Shuang-ling Lou, Shuang-ling Lou, Ya-dong Jiang, Ya-dong Jiang, "Substrate patterning for passive matrix organic light-emitting devices by photolithography processing", Proc. SPIE 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 67241E (21 November 2007); doi: 10.1117/12.782855; https://doi.org/10.1117/12.782855
PROCEEDINGS
5 PAGES


SHARE
Back to Top