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21 November 2007 Simulation on signal processing of focusing and leveling measurement system
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Proceedings Volume 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; 67241R (2007) https://doi.org/10.1117/12.782958
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China
Abstract
The position and tilt between the image plane of projection lens and wafer surface must be accurately measured and corrected as much as possible. Defocus always occurs when the imaging plane does not consist with the best focus plane. And it reduces the clarity of optical image. It has been reported that proper focusing is a critical factor in the lithography. An automatic focusing and leveling measurement system (FLMS) presented in the reference and widely used in high resolution lithography has been studied. We reveal a detailed principle of the signal processing of the FLMS and evaluate its performance by simulation. The simulation results show that measurement accuracy of the FLMS can be less than 10nm. And this FLMS meets the requirement of high resolution photolithography.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiaoping Li, Feibiao Chen, and Zhidan Li "Simulation on signal processing of focusing and leveling measurement system", Proc. SPIE 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 67241R (21 November 2007); https://doi.org/10.1117/12.782958
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