The behavior of substrate dependency as surface treatment in the positive chemically amplified resist

Sin-Ju Yang; Han-Sun Cha; Ju-Hyun Kang; Chul-Kyu Yang; Jin-Ho Ahn; Kee-Soo Nam

doi:10.1117/12.746652

30 October 2007 The behavior of substrate dependency as surface treatment in the positive chemically amplified resist

Sin-Ju Yang, Han-Sun Cha, Ju-Hyun Kang, Chul-Kyu Yang, Jin-Ho Ahn, Kee-Soo Nam

Proceedings Volume 6730, Photomask Technology 2007; 67300J (2007) https://doi.org/10.1117/12.746652
Event: SPIE Photomask Technology, 2007, Monterey, California, United States

Abstract

Positive chemically amplified resist (CAR) is widely used because of its benefit to high resolution in the semiconductor industry. Recent numerous studies have reported that resist pattern error such as resist scum and adhesion fail at the interface between substrate and positive CAR is caused by substrate dependency. Hence resist pattern error must be minimized. In this study we have observed the phenomena at the positive CAR coated mask blanks. And then we applied various surface treatments to the Cr film to minimize resist pattern error. Firstly, resist pattern error was occurred by the substrate dependency in the positive CAR coated mask blanks. We have investigated the root causes of this pattern error, we found that nitrogen radical and OH radical in the Cr film could combine with proton in the positive CAR easily. So various surface treatments were applied to minimize detrimental effects of substrate dependency to the positive CAR. And the behavior of substrate dependency was observed by various analyses to verify the effect of surface treatment method. The results showed that substrate dependency could be controlled by surface treatment in the positive CAR coated mask blanks.

Citation Download Citation

Sin-Ju Yang, Han-Sun Cha, Ju-Hyun Kang, Chul-Kyu Yang, Jin-Ho Ahn, and Kee-Soo Nam "The behavior of substrate dependency as surface treatment in the positive chemically amplified resist", Proc. SPIE 6730, Photomask Technology 2007, 67300J (30 October 2007); https://doi.org/10.1117/12.746652

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available