30 October 2007 Simulation of larger mask areas using the waveguide method with fast decomposition technique
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Proceedings Volume 6730, Photomask Technology 2007; 67301P (2007); doi: 10.1117/12.746631
Event: SPIE Photomask Technology, 2007, Monterey, California, United States
Abstract
A new and optimized waveguide based electromagnetic field solver with decomposition technique for rigorous optical and extreme ultraviolet (EUV) mask near field simulations is presented. The model allows to perform full three dimensional (full 3D) simulations as well as three dimensional simulations based on a decomposition technique (Q3D, "Q" means "quasi"). After a short introduction of the waveguide method the decomposition technique is presented. Subsequently the capabilities of the new electromagnetic field solver are demonstrated exemplarily based on state-of-the-art optical and EUV systems. The simulation of larger mask areas and the fast simulation of standard sized mask areas is shown. A comparison between the full 3D and the Q3D approach demonstrates the field of application of the decomposition technique.
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Peter Evanschitzky, Feng Shao, Andreas Erdmann, David Reibold, "Simulation of larger mask areas using the waveguide method with fast decomposition technique", Proc. SPIE 6730, Photomask Technology 2007, 67301P (30 October 2007); doi: 10.1117/12.746631; https://doi.org/10.1117/12.746631
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KEYWORDS
Computer simulations

3D image processing

Waveguides

Extreme ultraviolet

Near field

Photomasks

3D modeling

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