30 October 2007 Simulation of larger mask areas using the waveguide method with fast decomposition technique
Author Affiliations +
Proceedings Volume 6730, Photomask Technology 2007; 67301P (2007); doi: 10.1117/12.746631
Event: SPIE Photomask Technology, 2007, Monterey, California, United States
A new and optimized waveguide based electromagnetic field solver with decomposition technique for rigorous optical and extreme ultraviolet (EUV) mask near field simulations is presented. The model allows to perform full three dimensional (full 3D) simulations as well as three dimensional simulations based on a decomposition technique (Q3D, "Q" means "quasi"). After a short introduction of the waveguide method the decomposition technique is presented. Subsequently the capabilities of the new electromagnetic field solver are demonstrated exemplarily based on state-of-the-art optical and EUV systems. The simulation of larger mask areas and the fast simulation of standard sized mask areas is shown. A comparison between the full 3D and the Q3D approach demonstrates the field of application of the decomposition technique.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Peter Evanschitzky, Feng Shao, Andreas Erdmann, David Reibold, "Simulation of larger mask areas using the waveguide method with fast decomposition technique", Proc. SPIE 6730, Photomask Technology 2007, 67301P (30 October 2007); doi: 10.1117/12.746631; https://doi.org/10.1117/12.746631

Computer simulations

3D image processing


Extreme ultraviolet

Near field


3D modeling

Back to Top