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30 October 2007 Fast synthesis of topographic mask effects based on rigorous solutions
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Topographic mask effects can no longer be ignored at technology nodes of 45 nm, 32 nm and beyond. As feature sizes become comparable to the mask topographic dimensions and the exposure wavelength, the popular thin mask model breaks down, because the mask transmission no longer follows the layout. A reliable mask transmission function has to be derived from Maxwell equations. Unfortunately, rigorous solutions of Maxwell equations are only manageable for limited field sizes, but impractical for full-chip optical proximity corrections (OPC) due to the prohibitive runtime. Approximation algorithms are in demand to achieve a balance between acceptable computation time and tolerable errors. In this paper, a fast algorithm is proposed and demonstrated to model topographic mask effects for OPC applications. The ProGen Topographic Mask (POTOMAC) model synthesizes the mask transmission functions out of small-sized Maxwell solutions from a finite-difference-in-time-domain (FDTD) engine, an industry leading rigorous simulator of topographic mask effect from SOLID-E. The integral framework presents a seamless solution to the end user. Preliminary results indicate the overhead introduced by POTOMAC is contained within the same order of magnitude in comparison to the thin mask approach.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Qiliang Yan, Zhijie Deng, and James Shiely "Fast synthesis of topographic mask effects based on rigorous solutions", Proc. SPIE 6730, Photomask Technology 2007, 67302N (30 October 2007);


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