Paper
30 October 2007 Projection maskless patterning (PMLP) for the fabrication of leading-edge complex masks and nano-imprint templates
Elmar Platzgummer, Hans Loeschner, Gerhard Gross
Author Affiliations +
Abstract
The reliable and cost-effective fabrication of 2D and 3D structured nano-surfaces is prerequisite for a number of industrial and emerging applications: (i) leading-edge complex masks, (ii) high precision nano-imprint templates, (iii) nano-functionalized surfaces and 3D structures for applications in nano-photonics, nano-magnetics, and nano-biotechnology. Projection Mask-Less Patterning (PMLP) is based on many hundred thousands of ion beams working in parallel. A PMLP proof-of-concept tool has been realized as part of the European project CHARPAN (Charged Particle Nanotech; www.charpan.com). The novel ion beam projection optics with 200x reduction shows 16nm half pitch resolution. First results with a programmable aperture plate system have been achieved demonstrating high accuracy and flexible pattern fabrication.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Elmar Platzgummer, Hans Loeschner, and Gerhard Gross "Projection maskless patterning (PMLP) for the fabrication of leading-edge complex masks and nano-imprint templates", Proc. SPIE 6730, Photomask Technology 2007, 673033 (30 October 2007); https://doi.org/10.1117/12.746363
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CITATIONS
Cited by 9 scholarly publications.
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KEYWORDS
Ions

Argon

Optical lithography

Ion beams

Sputter deposition

Chromium

Silicon

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