16 November 2007 New method of identification of false or nuisance defects using defect imaging system DIS-05
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Abstract
This article presents novel defect review tool developed from CD-SEM, and its application for identification, classification and judgment of false or nuisance defects. Mask inspection tool is indispensable for mask production. Since conventional inspection tools use the optical source, some of the defects are difficult to be identified and classified in the proper manner because the tool resolution is not sufficient. We have developed the Defect Imaging System (DIS-05) based on CD-SEM which uses secondary electron and backscattered electron images. These SEM images are used for reviewing the defects detected in advance by optical inspection tools. This system also includes Die-to-Die, Die-to-Database and "any shaped pattern area measurement" of Holon original development.
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Hao Zhang, Hao Zhang, Katsuyuki Takahashi, Katsuyuki Takahashi, Hideaki Bando, Hideaki Bando, Yasunobu Kitayama, Yasunobu Kitayama, Akio Sugano, Akio Sugano, Kenichi Kobayashi, Kenichi Kobayashi, } "New method of identification of false or nuisance defects using defect imaging system DIS-05", Proc. SPIE 6730, Photomask Technology 2007, 67303M (16 November 2007); doi: 10.1117/12.746667; https://doi.org/10.1117/12.746667
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