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1 November 2007 Reconfigurable lithographic applications using polymer liquid crystal composite films
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Abstract
The proposed application of holographically formed polymer dispersed liquid crystal (H-PDLC) thin films is a real-time dynamically reconfigurable mask for the resist exposure step in the photolithographic process. H-PDLC films, or thin periodic nanostructures of alternating layers of polymer and liquid crystal have unique electro-optic properties including the ability to modulate a particular wavelength as a function of bias applied to the film. The H-PDLC photomask device consists of patterned electrodes that form pixels with independent bias control over each segment. This is achieved by etching the optically clear yet electrically conductive indium-tin-oxide electrodes on the glass confining the H-PDLC film. This mask has been used to cure Shipley 1800 series positive photoresist at its peak sensitivity wavelength of 440 nm. Structures formed using the H-PDLC photomask device have been compared to similar structures formed with a static photomask using an optical profilometer. Near vertical walls have been achieved using the H-PDLC photomask for structures with line width of 260 μm, and more narrow structures have been fabricated with resolution nearing 100 μm. Line width between structures formed using the H-PDLC mask and static photomask differ by less than 15%. Additionally, morphology studies have been performed on developed regions of glass and resist formed using a static and an H-PDLC mask to demonstrate that no structural defects exist due to formation under an H-PDLC grating.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anna E. Fox and Adam K. Fontecchio "Reconfigurable lithographic applications using polymer liquid crystal composite films", Proc. SPIE 6730, Photomask Technology 2007, 673048 (1 November 2007); https://doi.org/10.1117/12.746740
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