Translator Disclaimer
Paper
1 November 2007 A user-programmable link between data preparation and mask manufacturing equipment
Author Affiliations +
Abstract
In order to fully exploit the design knowledge during the operation of mask manufacturing equipment, as well as to enable the efficient feedback of manufacturing information upstream into the design chain, close communication links between the data processing domain and the machine are necessary. With shrinking design rules and modeling technology required to drive simulations and corrections, the amount and variety of measurements, for example, is steadily growing. This requires a flexible and automated setup of parameters and location information and their communication with the machine. The paper will describe a programming interface based on the Tcl/Tk language that contains a set of frequently reoccurring functions for data extraction and search, site characterization, site filtering, and coordinate transfer. It enables the free programming of the links, adapting to the flow and the machine needs. The interface lowers the effort to connect to new tools with specific measurement capabilities, and it reduces the setup and measurement time. The interface is capable of handling all common mask writer formats and their jobdecks, as well as OASIS and GDSII data. The application of this interface is demonstrated for the Carl Zeiss AIMSTM system.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Weidong Zhang, Grant Davis, Emile Sahouria, Steffen Schulze, Mohammed Saad, Arne Seyfarth, and Eric Poortinga "A user-programmable link between data preparation and mask manufacturing equipment", Proc. SPIE 6730, Photomask Technology 2007, 67304H (1 November 2007); https://doi.org/10.1117/12.746988
PROCEEDINGS
12 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

Fast full-chip MEEF simulations for mask and wafer metrology
Proceedings of SPIE (December 27 2002)
Integration of OPC and mask data preparation
Proceedings of SPIE (May 28 2003)
Mask calibration dominated methodology for OPC matching
Proceedings of SPIE (November 14 2007)
Model based OPC for node random size contact hole with...
Proceedings of SPIE (March 20 2006)
Mask manufacturability improvement by MRC
Proceedings of SPIE (October 30 2007)
Efficient automated tapeout system
Proceedings of SPIE (January 22 2001)

Back to Top