1 November 2007 Long-term critical dimension measurement performance for a new mask CD-SEM, S-9380M
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Abstract
To realize good repeatability in CD measurements, many issues have to be addressed including system stability, sample charging and contamination, measurement conditions, and image processing. The S-9380M is a mask CD-SEM (Critical Dimension Scanning Electron Microscope) system developed for measurement and inspection of 45 nm node photomask. The S-9380M has several innovations like a newly designed optical system to minimize sample charge-up and drift effects, ultra-high resolution (3nm) imaging to enable measurements at high magnification, and an integrated ultra-violet (UV) unit for pre-treatment of the mask to rid the surface of organic contaminants. This paper presents measurements carried out using the S-9380M system, and showed that superior performance is achieved with short-term dynamic repeatability of 3σ less than 0.6 nm (for line patterns), and long-term dynamic repeatability of 3σ less than 1.0 nm without trend modification.
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Zhigang Wang, Zhigang Wang, Kock Khuen Seet, Kock Khuen Seet, Ritsuo Fukaya, Ritsuo Fukaya, Yasuhiro Kadowaki, Yasuhiro Kadowaki, Noriaki Arai, Noriaki Arai, Makoto Ezumi, Makoto Ezumi, Hidetoshi Satoh, Hidetoshi Satoh, } "Long-term critical dimension measurement performance for a new mask CD-SEM, S-9380M", Proc. SPIE 6730, Photomask Technology 2007, 67304T (1 November 2007); doi: 10.1117/12.746332; https://doi.org/10.1117/12.746332
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