30 October 2007 Metrology for templates of UV nano imprint lithography
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Abstract
Templates for UV-Nano-imprint lithography (NIL) have developed aggressively. Feature sizes of the templates have come to less than 30 nm. Therefore metrology is also one of challenging items to fabricate templates for UV-NIL. However, there are many issues in metrology for the templates, for instance, necessity of the further resolution for measurement tools, charging issues without conductive layers for a SEM. In this paper, we will focus on metrology of the templates for UV-NIL. And also some measurement techniques are described about detail results using scanning probe microscope, CD-SEM, scattermetry and so on.
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Kouji Yoshida, Kouichirou Kojima, Makoto Abe, Shiho Sasaki, Masaaki Kurihara, Hiroshi Mohri, Naoya Hayashi, "Metrology for templates of UV nano imprint lithography", Proc. SPIE 6730, Photomask Technology 2007, 67305O (30 October 2007); doi: 10.1117/12.746802; https://doi.org/10.1117/12.746802
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