17 July 2007 Laser writing systems and technologies for fabrication of binary and continuous relief diffractive optical elements
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Proceedings Volume 6732, International Conference on Lasers, Applications, and Technologies 2007: Laser-assisted Micro- and Nanotechnologies; 67320X (2007); doi: 10.1117/12.751930
Event: International Conference on Lasers, Applications, and Technologies '07, 2007, Minsk, Belarus
Abstract
Precision laser-writing systems operated in polar coordinates and direct writing technologies for fabrication of diffractive optical elements and computer generated holograms have been described. These systems can manufacture continuous-relief and binary microstructures with minimum feature sizes of less than 0.6 μm and laser beam positioning accuracy of 0.05 μm over 300-mm substrates. Hardware and software of the system permit to write on different types of photosensitive and thermal recording materials. Several examples of fabricated diffractive elements have been presented.
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A. G. Poleshchuk, V. P. Korolkov, "Laser writing systems and technologies for fabrication of binary and continuous relief diffractive optical elements", Proc. SPIE 6732, International Conference on Lasers, Applications, and Technologies 2007: Laser-assisted Micro- and Nanotechnologies, 67320X (17 July 2007); doi: 10.1117/12.751930; https://doi.org/10.1117/12.751930
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KEYWORDS
Computer generated holography

Diffractive optical elements

Photoresist materials

Binary data

Laser systems engineering

Chromium

Multiphoton lithography

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