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10 October 2007 A ray tracing approach to inverse pattern profilometry
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Abstract
To achieve object matched inverse patterns for the profilometric measurement of the shape of manufactured surfaces, in general at first the shape of a faultless reference object must be known. For these purposes, a separate profilometric measurement cycle employing the reference object as specimen can be executed, if a reference object of adequate quality is available. Based upon this first measurement, an object matched inverse pattern is calculated, and the shape of an arbitrary specimen can then be compared to the ideal shape of the reference object. This paper proposes an algorithm to find inverse patterns for analytically known reference objects based upon ray tracing techniques without requiring a physically existing reference. It further provides methods for the automated derivation of setup parameters for a general profilometric measurement setup.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Veronika Putz and Bernhard G. Zagar "A ray tracing approach to inverse pattern profilometry", Proc. SPIE 6762, Two- and Three-Dimensional Methods for Inspection and Metrology V, 67620I (10 October 2007); https://doi.org/10.1117/12.733944
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