Paper
10 September 2007 Monolithically integrated III-Sb diode lasers on Si using interfacial misfit arrays
D. L. Huffaker, G. Balakrishnan, A. Jallipalli, M. N. Kutty, S. H. Huang, L. R. Dawson
Author Affiliations +
Abstract
We present a 1.54 μm, 77 K, pulsed GaSb quantum well (QW) laser diode grown monolithically on a Si(100)-5° substrate. The III-Sb device is grown on an AlSb nucleation layer on Si with the 13% mismatch accommodated by a self-assembled 2D array of pure 90° dislocations. We demonstrate the simultaneous formation of this interfacial misfit dislocation (IMF) array along with antiphase domain suppression in the growth of AlSb on 5° miscut Si (001) substrate. The lomer dislocation spacing in the IMF (~ 3.46 nm) corresponds to the 13% mismatch between AlSb and Si and is also well matched to the step length of the 5° miscut Si (001) substrate. The resulting bulk material has both very low defect density (~7 × 105/cm2) and very low APD density (~ 103/cm2) confirmed by transmission electron and atomic force microscope images. The GaSb QW based laser diodes are grown on this high quality AlSb layer and the resulting devices operate at 77 K under pulsed conditions (2 μsec pulse-width and a 0.1% duty cycle) with an emission wavelength of 1.54 μm and a threshold current density of 2 kA/cm2 for a 100 μm x 2mm device. The maximum peak power from the device is ~ 20 mWatts.
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D. L. Huffaker, G. Balakrishnan, A. Jallipalli, M. N. Kutty, S. H. Huang, and L. R. Dawson "Monolithically integrated III-Sb diode lasers on Si using interfacial misfit arrays", Proc. SPIE 6775, Active and Passive Optical Components for Communications VII, 67750L (10 September 2007); https://doi.org/10.1117/12.737224
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KEYWORDS
Silicon

Semiconductor lasers

Avalanche photodetectors

Gallium antimonide

Antimony

Quantum wells

Gallium

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