Ion-Assisted Deposition Of Fluorides

J D Targove; M J Messerly; J P Lehan; C C Weng; R H Potoff; H A Macleod; L C McIntyre Jr.; J A Leavitt

doi:10.1117/12.939545

23 December 1986 Ion-Assisted Deposition Of Fluorides

J D Targove, M J Messerly, J P Lehan, C C Weng, R H Potoff, H A Macleod, L C McIntyre Jr., J A Leavitt

Proceedings Volume 0678, Optical Thin Films II: New Developments; (1986) https://doi.org/10.1117/12.939545
Event: 30th Annual Technical Symposium, 1986, San Diego, United States

Abstract

Ion-assisted deposition (IAD) has been used to deposit magnesium fluoride, cryolite (Na3A1F6), and lanthanum fluoride films on ambient temperature substrates. IAD magnesium fluoride coatings show increased density and moisture resistance, while IAD lanthanum fluoride coatings exhibit increased refractive indices. Cryolite films, however, do not significantly benefit from IAD. Oxygen, rather than argon, as the bombarding species reduces bombardment-induced absorption in the visible, but may produce an additional oxide absorption edge in the ultraviolet.

Citation Download Citation

J D Targove, M J Messerly, J P Lehan, C C Weng, R H Potoff, H A Macleod, L C McIntyre Jr., and J A Leavitt "Ion-Assisted Deposition Of Fluorides", Proc. SPIE 0678, Optical Thin Films II: New Developments, (23 December 1986); https://doi.org/10.1117/12.939545

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