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Phase-shifting photomask repair and repair validation procedure for transparent and opaque defects relevant for the 45nm node and beyond
Alternative approach to transparent stamps for UV-based nanoimprint lithography: techniques and materials
Comparative scatterometric CD and edge profile measurements on a MoSi mask using different scatterometers
Top surface imaging study by selective chemisorptions of poly(dimethyl siloxane) on diazoketo-functionalized polymeric surface
Advances in fabrication of x-ray masks based on vitreous carbon using a new UV sensitive positive resist
New results from DUV water immersion microscopy using the CD metrology system LWM500 WI with a high NA condenser