2 May 2008 Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition technique
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Proceedings Volume 6792, 24th European Mask and Lithography Conference; 679206 (2008) https://doi.org/10.1117/12.798519
Event: 24th European Mask and Lithography Conference, 2008, Dresden, Germany
Abstract
A new and optimized electromagnetic field (EMF) solver based on the waveguide method with a decomposition technique for rigorous optical and extreme ultraviolet (EUV) mask near field simulations is presented. The implemented software algorithm enables full three dimensional (full 3D) mask simulations as well as three dimensional mask simulations based on a parallelized decomposition technique (Q3D, "Q" stands for "quasi"). After a short introduction to the waveguide method and to an optimized mask description, the basis of the decomposition technique and its parallelization are presented. Subsequently the capabilities of the new electromagnetic field solver are demonstrated by simulations of advanced optical and EUV imaging problems. Simulations of larger sized mask areas and of standard sized defective EUV mask areas using the decomposition technique are shown. Finally, a further reduction of computation time using parallelization is demonstrated.
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Feng Shao, Feng Shao, Peter Evanschitzky, Peter Evanschitzky, David Reibold, David Reibold, Andreas Erdmann, Andreas Erdmann, } "Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition technique", Proc. SPIE 6792, 24th European Mask and Lithography Conference, 679206 (2 May 2008); doi: 10.1117/12.798519; https://doi.org/10.1117/12.798519
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