2 May 2008 Printing of sub-resolution shots in electron beam direct write with variable shaped beam machines
Author Affiliations +
Proceedings Volume 6792, 24th European Mask and Lithography Conference; 67920B (2008) https://doi.org/10.1117/12.798585
Event: 24th European Mask and Lithography Conference, 2008, Dresden, Germany
Abstract
The resolution of a variable shaped beam writer is typically given for the standard geometries like isolated line, isolated space, and dense (1:1) line/space pattern. It is related to the imaging power of both the tool itself as well as the resist process. In this paper we concentrate on small shots with dimensions smaller than the resolution limit, butting to a larger shot. We show experimentally that for a line resolution of 40 nm the resolution for butting sub resolution shots can be as small as 20 nm.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Frank Thrum, Frank Thrum, Johannes Kretz, Johannes Kretz, Christoph Hohle, Christoph Hohle, Kang-Hoon Choi, Kang-Hoon Choi, Katja Keil, Katja Keil, } "Printing of sub-resolution shots in electron beam direct write with variable shaped beam machines", Proc. SPIE 6792, 24th European Mask and Lithography Conference, 67920B (2 May 2008); doi: 10.1117/12.798585; https://doi.org/10.1117/12.798585
PROCEEDINGS
6 PAGES


SHARE
RELATED CONTENT

Multi-beam mask writer MBM-1000
Proceedings of SPIE (April 04 2018)
Evaluation of an advanced mask-writing system: II
Proceedings of SPIE (December 29 1999)
EUV OPC for 56nm metal pitch
Proceedings of SPIE (April 05 2011)

Back to Top