Alternative approach to transparent stamps for UV-based nanoimprint lithography: techniques and materials

Anna Klukowska; Marko Vogler; Anett Kolander; Freimut Reuther; Gabi Gruetzner; Michael Muehlberger; Iris Bergmair; Rainer Schoeftner

doi:10.1117/12.798602

2 May 2008 Alternative approach to transparent stamps for UV-based nanoimprint lithography: techniques and materials

Anna Klukowska, Marko Vogler, Anett Kolander, Freimut Reuther, Gabi Gruetzner, Michael Muehlberger, Iris Bergmair, Rainer Schoeftner

Author Affiliations +

Proceedings Volume 6792, 24th European Mask and Lithography Conference; 67920J (2008) https://doi.org/10.1117/12.798602
Event: 24th European Mask and Lithography Conference, 2008, Dresden, Germany

Abstract

The motivation for the presented research was the known issue of very expansive UV transparent stamps and moulds, which are necessary tools for UV-based patterning methods such as UV-based nanoimprint lithography, which has been developing as an attractive alternative lithography approach in recent 10 years. Low priced polymer working stamps could be an alternative to quartz as stamp material. UV transparent nanoimprint stamps were fabricated from sol-gel process-derived hybrid polymer, which has the benefit of high thermal, chemical and UV radiation stability. Tailored surface treatment and release agents were applied to ease the de-moulding process and secure the accuracy and fidelity of the transferred patterns. To increase the life time of the hybrid polymer nanoimprint stamps some adhesives between stamp substrate and the stamp material were used. The hybrid polymer stamps are compatible with NIL polymers and long-term stable even at elevated temperatures of thermal imprint processes.

Citation Download Citation

Anna Klukowska, Marko Vogler, Anett Kolander, Freimut Reuther, Gabi Gruetzner, Michael Muehlberger, Iris Bergmair, and Rainer Schoeftner "Alternative approach to transparent stamps for UV-based nanoimprint lithography: techniques and materials", Proc. SPIE 6792, 24th European Mask and Lithography Conference, 67920J (2 May 2008); https://doi.org/10.1117/12.798602

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available