2 May 2008 Alternative approach to transparent stamps for UV-based nanoimprint lithography: techniques and materials
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Proceedings Volume 6792, 24th European Mask and Lithography Conference; 67920J (2008) https://doi.org/10.1117/12.798602
Event: 24th European Mask and Lithography Conference, 2008, Dresden, Germany
Abstract
The motivation for the presented research was the known issue of very expansive UV transparent stamps and moulds, which are necessary tools for UV-based patterning methods such as UV-based nanoimprint lithography, which has been developing as an attractive alternative lithography approach in recent 10 years. Low priced polymer working stamps could be an alternative to quartz as stamp material. UV transparent nanoimprint stamps were fabricated from sol-gel process-derived hybrid polymer, which has the benefit of high thermal, chemical and UV radiation stability. Tailored surface treatment and release agents were applied to ease the de-moulding process and secure the accuracy and fidelity of the transferred patterns. To increase the life time of the hybrid polymer nanoimprint stamps some adhesives between stamp substrate and the stamp material were used. The hybrid polymer stamps are compatible with NIL polymers and long-term stable even at elevated temperatures of thermal imprint processes.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anna Klukowska, Anna Klukowska, Marko Vogler, Marko Vogler, Anett Kolander, Anett Kolander, Freimut Reuther, Freimut Reuther, Gabi Gruetzner, Gabi Gruetzner, Michael Muehlberger, Michael Muehlberger, Iris Bergmair, Iris Bergmair, Rainer Schoeftner, Rainer Schoeftner, } "Alternative approach to transparent stamps for UV-based nanoimprint lithography: techniques and materials", Proc. SPIE 6792, 24th European Mask and Lithography Conference, 67920J (2 May 2008); doi: 10.1117/12.798602; https://doi.org/10.1117/12.798602
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