2 May 2008 Assessment and application of focus drilling for DRAM contact hole fabrication
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Proceedings Volume 6792, 24th European Mask and Lithography Conference; 67920Q (2008) https://doi.org/10.1117/12.798807
Event: 24th European Mask and Lithography Conference, 2008, Dresden, Germany
Abstract
By assessment of options for the fabrication of small contact holes in DRAM devices the method of focus drilling was identified and investigated to overcome the depth of focus limitations. By use of ArF-dry lithography a practical shrink of the target CD by 15nm can be achieved both with a focus offset double exposure (FODEX) and with a tilted stage approach. This was optimized in simulation and demonstrated by CD measurement on wafer, as well as by electrical measurement on integrated lots. Application of dual lambda focus drilling is limited by the chromatic magnification error of the lens. The increase of hole-to-hole CD variations due to a lower dose latitude and to increased MEEF was characterized. As improvement option the use of a high transmission attPSM was identified.
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Christoph Noelscher, Christoph Noelscher, Franck Jauzion-Graverolle, Franck Jauzion-Graverolle, Thomas Henkel, Thomas Henkel, } "Assessment and application of focus drilling for DRAM contact hole fabrication", Proc. SPIE 6792, 24th European Mask and Lithography Conference, 67920Q (2 May 2008); doi: 10.1117/12.798807; https://doi.org/10.1117/12.798807
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