3 April 2008 Determination of the optical constants and thickness of titanium oxide thin film by envelope method
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Proceedings Volume 6793, International Workshop and Conference on Photonics and Nanotechnology 2007; 67930J (2008) https://doi.org/10.1117/12.799420
Event: International Workshop and Conference on Photonics and Nanotechnology 2007, 2007, Pattaya, Thailand
Abstract
Transparent titanium oxide thin film was deposited by DC reactive magnetron sputtering method onto glass slides and silicon wafer substrates. The film was characterized by AFM, XRD and spectrophotometer for film's thickness, crystallographic structure and transmission spectrum respectively. The film's thickness was, from AFM, found to be about 296 nm. XRD measurement shows that the film is crystallized in rutile phase. Absorption coefficient and the thickness of the films were calculated from interference of transmittance spectra. Optical constants such as refractive index (n) and extinction coefficient (k) were determined as a function of wavelength over the wavelength range from 400 to 800 nm using envelope methods.
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N. Witit-anun, N. Witit-anun, P. Rakkwamsuk, P. Rakkwamsuk, P. Limsuwan, P. Limsuwan, "Determination of the optical constants and thickness of titanium oxide thin film by envelope method", Proc. SPIE 6793, International Workshop and Conference on Photonics and Nanotechnology 2007, 67930J (3 April 2008); doi: 10.1117/12.799420; https://doi.org/10.1117/12.799420
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