21 November 2007 Free-standing SU-8 gratings fabricated by sacrificial layer-assisted UV curing imprint
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We present results on the nanofabrication of high density patterns in SU-8 resist, based on nanoimprinting combined with UV curing. The bilayer process using PMMA as sacrificial layer was developed to release the SU-8 layer to form three dimensional structures. The SU-8 displays excellent imprint property and well defined patterns are achieved at at low temperature, low pressure after demolding process. Using this technology, 300nm period SU-8 subwavelengh gratings and nanochannels were fabricated on flat substrate with good fidelity. This sacrificial layer-assisted UV curing imprint technology offers versatility and flexibility to stack polymer layers and sealed fluidic channels.
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Xudi Wang, Zijun Zhang, Liangjin Ge, Yanlin Liao, Shaojun Fu, "Free-standing SU-8 gratings fabricated by sacrificial layer-assisted UV curing imprint", Proc. SPIE 6827, Quantum Optics, Optical Data Storage, and Advanced Microlithography, 68271T (21 November 2007); doi: 10.1117/12.757290; https://doi.org/10.1117/12.757290

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