21 November 2007 Free-standing SU-8 gratings fabricated by sacrificial layer-assisted UV curing imprint
Author Affiliations +
Abstract
We present results on the nanofabrication of high density patterns in SU-8 resist, based on nanoimprinting combined with UV curing. The bilayer process using PMMA as sacrificial layer was developed to release the SU-8 layer to form three dimensional structures. The SU-8 displays excellent imprint property and well defined patterns are achieved at at low temperature, low pressure after demolding process. Using this technology, 300nm period SU-8 subwavelengh gratings and nanochannels were fabricated on flat substrate with good fidelity. This sacrificial layer-assisted UV curing imprint technology offers versatility and flexibility to stack polymer layers and sealed fluidic channels.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xudi Wang, Xudi Wang, Zijun Zhang, Zijun Zhang, Liangjin Ge, Liangjin Ge, Yanlin Liao, Yanlin Liao, Shaojun Fu, Shaojun Fu, } "Free-standing SU-8 gratings fabricated by sacrificial layer-assisted UV curing imprint", Proc. SPIE 6827, Quantum Optics, Optical Data Storage, and Advanced Microlithography, 68271T (21 November 2007); doi: 10.1117/12.757290; https://doi.org/10.1117/12.757290
PROCEEDINGS
6 PAGES


SHARE
Back to Top