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27 November 2007 Advances in OPC technology and development of ZOPC tool
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As the most important RET (Resolution Enhancement Technology), OPC (Optical Proximity Correction) technology has been widely used in today's IC manufacturing and is still developing very fast both in its principle and its practice. In this invited paper, key techniques of OPC are classified and overviewed; progresses of OPC technology in recent years published in major SPIE symposiums are reviewed as well. Recent research results produced by Zhejiang University's team are described and reviewed with highlighting. An OPC tool suite named ZOPC, which has been designed to enable new OPC techniques to be integrated into one platform, is presented. The framework of ZOPC as well as its working scheme is demonstrated with real examples.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiaolang Yan, Zheng Shi, Ye Chen, and Qijun Chen "Advances in OPC technology and development of ZOPC tool", Proc. SPIE 6827, Quantum Optics, Optical Data Storage, and Advanced Microlithography, 68271U (27 November 2007);


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