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4 January 2008 Generation of phase-shift patterns in the optical far field and its applications
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Abstract
We introduce and compare two methods to produce the phase-shift patterns, which are widely generated in the near-field lithography, in the optical far field. The key component of the two methods is a phase-only diffractive optical element, a similar function found in the maskless lithography. The technique to produce a smaller feature size was a major improvement beyond the diffraction limit.
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Wei-Feng Hsu, Yu-Weng Chen, and Yuan-Hong Su "Generation of phase-shift patterns in the optical far field and its applications", Proc. SPIE 6832, Holography and Diffractive Optics III, 68320J (4 January 2008); https://doi.org/10.1117/12.757054
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