Analysis of the thermal stress of IRFPA assembly using FEM

Haiyan Zhang; Huajie Lu

doi:10.1117/12.757438

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8 January 2008 Analysis of the thermal stress of IRFPA assembly using FEM

Haiyan Zhang; Huajie Lu

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Proceedings Volume 6835, Infrared Materials, Devices, and Applications; 68350J (2008) https://doi.org/10.1117/12.757438
Event: Photonics Asia 2007, 2007, Beijing, China

Abstract

Thermal stress is a common problem as for the cryogenic IRFPA (Infrared Focal Plane Array) Assembly, especially when the assembly is in large scale. The stress is generated when the assembly enduring times of temperature cycling ranging from 80K to 300K approximately. This huge temperature change and the mismatch of the CTE (coefficient of thermal expansion) between these materials by which the assembly is made results in severe thermal stress in the IRFPA. This thermal stress is the main reason for the failure of assembly during temperature cycling such as the degradation of device performance and even the die crack. To improve the reliability of the FPA assembly reducing the thermal stress becomes a more important issue. This article presents several results of the analysis of the thermal stress of IRFPA assembly using FEM (Finite Element Method). According to this result we have got an optimal design of the assembly structure.

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Haiyan Zhang and Huajie Lu "Analysis of the thermal stress of IRFPA assembly using FEM", Proc. SPIE 6835, Infrared Materials, Devices, and Applications, 68350J (8 January 2008); https://doi.org/10.1117/12.757438

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