4 January 2008 Design of maskless lithography system based on DMD
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Abstract
An experiment system of maskless lithography has been presented using the characteristics of digital micro-mirror device (DMD) and principle of light refraction and diffraction. The experiment system contains a worked lamp-house, a DMD controlled by computer and an imaging system. The main parameter of devices, such as the incident and reflected light on DMD by selection of optimal optical devices and realizes process of exposure have been designed. In this paper, the particular characteristics of this system were described and some preliminary experimental results were discussed in finally. With this system, the realizable rate of reduction projecting is 14; the minimum precision is 1.3μm. It avoids the process of replacement mask and subsequent problems, and simplifies operation process, improves overlay accuracy, shortens production cycle of IC, and greatly decreases production cost. It is convenient to actualize the process of exposal and optional to replace the digital mask. These can provide possibility for maskless lithography being further improved.
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Jianping Ma, Jianping Ma, Xinrong Du, Xinrong Du, Yantao Liu, Yantao Liu, } "Design of maskless lithography system based on DMD", Proc. SPIE 6836, MEMS/MOEMS Technologies and Applications III, 683612 (4 January 2008); doi: 10.1117/12.756601; https://doi.org/10.1117/12.756601
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