8 January 2008 Novel polymer DFB gratings based on UV photopolymerization for organic semiconductor lasers
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Abstract
A novel polymer distributed feedback (DFB) gratings are developed via UV photopolymerization in order to lower lasing threshold to realize electrically driven polymer lasers. A photopolymer formulation sensitive to 355 nm ultraviolet light is proposed for the fabrication of polymer gratings can be used to form polymer films by spin-coating process. Polymer gratings with periods ranging from 200 to 1000 nm were fabricated based on photopolymerization-induced internal diffusion process. A very low surface relief depth ranging from 12.5 to about 1.0 nm has been demonstrated with a refractive index modulation Δn of about 0.012. Results of theoretical analysis indicate that the quality of the polymer film should be improved in order to improve the refractive index modulation of short-period DFB gratings. Such polymer gratings show promising potentials for the fabrication of low-order DFB organic semiconductor lasers.
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Xuan-ke Zhao, Xuan-ke Zhao, Qing-hua Zhang, Qing-hua Zhang, Qing-wu Zhao, Qing-wu Zhao, Lian-fen Wang, Lian-fen Wang, "Novel polymer DFB gratings based on UV photopolymerization for organic semiconductor lasers", Proc. SPIE 6838, Optoelectronic Devices and Integration II, 68381X (8 January 2008); doi: 10.1117/12.757392; https://doi.org/10.1117/12.757392
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