Translator Disclaimer
11 February 2008 Retinal thermal laser damage thresholds for different beam profiles and scanned exposure
Author Affiliations +
Proceedings Volume 6844, Ophthalmic Technologies XVIII; 68441L (2008)
Event: SPIE BiOS, 2008, San Jose, California, United States
A computer model was used to predict thresholds for 532 nm scanned retinal exposure and exposure for different retinal beam profile geometries, including rectangles and ring shaped profiles. The image analysis method described in IEC 60825-1 Edition 1.2--maximizing the ratio of power within a rectangle over the value of &agr; for this rectangle--was applied to the different profiles to determine &agr; and the fractional power that would be compared to the MPE value. The predicted thresholds for these special types of retinal exposure were compared with the predicted damage threshold for top hat profiles for the value of &agr; that resulted from the image analysis method. The comparison shows that the most restrictive power/&agr; ratio method produces appropriate results, provided that a time dependent &agr;max is used, as was proposed at BIOS 2006.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Karl Schulmeister, Reinhard Gilber, Bernhard Seiser, Florian Edthofer, Johannes Husinsky, Beate Fekete, and Letizia Farmer "Retinal thermal laser damage thresholds for different beam profiles and scanned exposure", Proc. SPIE 6844, Ophthalmic Technologies XVIII, 68441L (11 February 2008);

Back to Top