23 February 2008 Interactions between pulsed laser-induced plasma and ECR microwave plasma
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Abstract
Pulsed-laser deposition (PLD) is a versatile technique for thin film deposition. The generation and propagation of laser-induced plasmas have been extensively studied. Other plasma sources have been combined with PLD to improve the film qualities. The knowledge about the interactions between the laser-induced plasmas and additional plasmas and their effects on film growth is still limited. We have investigated the optical emission spectra from the interaction region of low-pressure ECR microwave plasmas and pulsed-laser-induced plasmas. In this region, the spatial and temporal distributions of the laser-ablated species were altered while very few collisions were expected in the ambient gas due to the low pressure. The results were compared with those with laser ablation or ECR microwave discharge along. The mechanisms and effects of the interactions were discussed.
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Junyi Tang, Jian Sun, Hao Wang, Jie Shao, Hao Ling, Xiaokang Shen, Jiada Wu, Yongfeng Lu, "Interactions between pulsed laser-induced plasma and ECR microwave plasma", Proc. SPIE 6880, Laser-based Micro- and Nanopackaging and Assembly II, 68800M (23 February 2008); doi: 10.1117/12.762277; https://doi.org/10.1117/12.762277
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