Paper
12 February 2008 Microfabricated implantable flow sensor for medical applications
Author Affiliations +
Abstract
A RF wireless capacitive flow sensor is developed. The sensor has integrated inductor with the flow sensitive capacitors as LC circuit. The resonant frequency of the sensor changes as the capacitance changes with applied flow. The sensor uses LPCVD silicon nitride as sensitive membrane and the residual stress of the membrane has been measure as 139 MPa. The sensor has size of 10 mm × 4 mm × 0.5 μm. The sensor integrated two pressure sensors together and designed related to flow 5-20ml/hour. The deflection of different shape of membranes and the parameters of flow sensor sensitivity are discussed. The deflection of square membrane is 130% to circular membrane under same applied pressure.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sheng Liu, Reginald Farrow, James L. Zunino III, Hee C. Lim, John Federici, and Gordon Thomas "Microfabricated implantable flow sensor for medical applications", Proc. SPIE 6886, Microfluidics, BioMEMS, and Medical Microsystems VI, 688606 (12 February 2008); https://doi.org/10.1117/12.763795
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Cited by 1 scholarly publication.
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KEYWORDS
Sensors

Silicon

Capacitors

Low pressure chemical vapor deposition

Metals

Plasma enhanced chemical vapor deposition

Finite element methods

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